For more information, contact:

Marna Shillman
Advanced Energy Industries, Inc.
Angie Kellen

AE to Feature Aera® PI-980™ Series Pressure-Insensitive MFC for Advanced Processes at SEMICON Japan 2005

HACHIOJI, Japan., November 30, 2005—Advanced Energy K.K. today announced that it will feature its Aera® PI-980™ series pressure-insensitive mass flow controller (MFC) during SEMICON Japan 2005. The company also will showcase its Navigator™ digital matching network, Ovation™ very-high frequency (VHF) power delivery system, Litmas™ RPS 1501 and 3001 remote plasma source platform and the Aera® EPV exhaust pressure controller at the exposition, held December 7-9 at the Makuhari Messe (Nippon Convention Center) in Chiba, Japan.


The new Aera PI-980 series pressure-insensitive MFC delivers greater flow stability, faster response, higher accuracy and superior real-time process control than previous technologies or competitive products. The PI-980 series is especially well-suited for etch, CVD, PVD and diffusion applications. The advanced design integrates traditional thermal flow architecture with a pressure sensor, pressure display, temperature sensor and NeuralStep™ control technology, creating a single delivery package and eliminating the need for the costly gas-panel components traditionally used to perform the same function. Its superior gas-flow stability delivers greater chamber-to-chamber process repeatability for improved production yields.

Also showcased this year in AE’s booth #4A-606 will be the Navigator, which is equipped with microprocessor-controlled stepper motor circuitry and digital, user-selectable tuning algorithms. The Navigator matching network minimizes reflected power by automatically tuning the complex impedance of a coupled plasma. An optional, internal Z’Scan® RF sensor allows real-time measurement and analysis of process power and impedance, providing the ability to identify and significantly reduce process variability. The Navigator digital matching network provides advanced match technology for rapid, accurate and reliable matching across a wide range of load impedances.

In addition, AE will feature the Ovation very-high frequency (VHF) power delivery system. As a fully-integrated power delivery system, Ovation enables faster, higher-precision processes, such as those required for demanding narrow-linewidth, dielectric etch processes through implementation of a unique power delivery scheme. It is the first to accurately deliver power into a non-50-ohm environment without an external sensor, reacting faster than traditional power supplies. The 60-MHz design reduces voltage potential across the plasma sheath, minimizing ion etch damage, thus improving film quality and yields. Its embedded measurement technology enables previously unavailable insight into chamber plasma parameters and performance.

Also exhibited at the show will be AE’s Litmas RPS 1.5 kW and 3 kW integrated plasma source and power-delivery systems. The Litmas RPS is well-suited to deliver reactive gas specie fluxes for process applications such as wafer pre-clean, photoresist strip and thin-film deposition. Its small footprint, high performance, ease of use and low cost of ownership allow process engineers to focus on developing critical plasma-based processes with lower device damage, higher throughput and higher yields.

AE will also showcase the Aera EPV-100AP Exhaust Pressure Controller, a patented technology which makes it possible to control the thickness of tunnel-gate oxide films—even with atmospheric pressure changes, such as weather conditions or altitude more precisely then previous technologies.

To learn more about AE’s products during SEMICON Japan, December 7-9, visit their booth #4A-606 in hall 4 at the Makuhari Messe (Nippon Convention Center) in Chiba, Japan. Editors interested in meeting with AE during the show may contact Angie Kellen by phone at: (650) 968-8900 x120, or email:

About Advanced Energy
Advanced Energy is a global leader in the development and support of technologies critical to high-technology manufacturing processes used in the production of semiconductors, flat panel displays, data storage products, solar cells, architectural glass and other advanced product applications.

Leveraging a diverse product portfolio and technology leadership, AE creates solutions that maximize process impact, improve productivity and lower cost of ownership for its customers. This portfolio includes a comprehensive line of technology solutions in power, flow management, thermal instrumentation and plasma and ion beam sources for original equipment manufacturers (OEMs) and end-users around the world.

AE operates in regional centers in North America, Asia and Europe and offers global sales and support through direct offices, representatives and distributors. Founded in 1981, AE is a publicly held company traded on Nasdaq National Market under the symbol AEIS. More information can be found at

Advanced Energy, AE, Aera, PI-980, NeuralStep, Navigator, Z’Scan, Ovation and Litmas are trademarks of Advanced Energy Industries, Inc.