For more information, contact:

Jim Donaldson
Advanced Energy Industries, Inc.
Marna Shillman
Advanced Energy Industries, Inc.

Advanced Energy Rolls Out Xstream™ Remote Plasma Source With Active Matching Network™

Fully Integrated Plasma-Source Platform for CVD Clean and Reactive-Gas Processes Optimizes the Use of Expensive Process Resources


FORT COLLINS, Colo., June 3, 2003—Advanced Energy Industries (Nasdaq: AEIS) today introduced its new plasma-source platform designed to deliver reactive gases in both upstream and downstream configurations for remote chamber clean and other advanced semiconductor and flat-panel display applications. By utilizing a remote source, Xstream products extend the life of chamber consumables and fixtures and reduce the particle generation inherent with in-situ plasma sources, significantly reducing cost of ownership. The Xstream™ platform fully integrates a remote plasma source, a 6 kW or 8 kW high-efficiency power supply and a solid-state active matching network.

Building on patented, field-proven technology in previous AE products, the Xstream platform’s active matching network accommodates the widest impedance operating range commercially available. This enables a single Xstream unit to operate with a broad range of chemistries—without re-engineering or modifying software or hardware—further reducing costs.

“We designed the Xstream platform with today’s process engineer in mind,” said Steve Rhoades, senior vice president and general manager of AE’s Control Systems and Instrumentation group. “New, 300 mm applications pose new challenges to both upstream and downstream processes. Xstream technology expands the impedance operating range to nearly one and one-half times that of other plasma sources. This enables new levels of process flexibility, system throughput and cost savings not possible with other sources.”

Xstream Features and Capabilities The Xstream 8 kW model operates from 1000 W to 8000 W; the 6 kW operates from 1000 W to 6000 W. The Xstream platform consumes less water than competitive units and features an enhanced gas-feed design that delivers gas at a rate of up to 6 lpm at 12 Torr. The Xstream platform uniformly diffuses gas throughout the chamber, enabling dissociation efficiencies of greater than 98 percent. The Xstream vacuum chamber’s internal anodized surface is designed for long life in corrosive environments. In AE’s Reliability Laboratory, Xstream units have to date demonstrated an MTBF in excess of 150,000 hours.

About Advanced Energy
Advanced Energy is a global leader in the development and support of process-centered technologies critical to plasma-based manufacturing processes used in the production of semiconductors, flat panel displays, data storage products, compact discs, digital video discs, architectural glass, and other advanced product applications.

Leveraging a diverse product portfolio and technology leadership, AE creates solutions that maximize process impact, improve productivity and lower cost of ownership for its customers. This portfolio includes a comprehensive line of technology solutions in power, flow and thermal management, plasma and ion beam sources, and integrated process monitoring and control for original equipment manufacturers (OEMs) and end-users around the world.

AE operates in regional centers in North America, Asia and Europe, and offers global sales and support through direct offices, representatives and distributors. Founded in 1981, AE is a publicly-held company traded on Nasdaq National Market under the symbol AEIS. For more information, please visit our corporate website: