For more information, contact:

Jim Donaldson
Advanced Energy Industries, Inc.
Marna Shillman
Advanced Energy Industries, Inc.

Noah Precision Introduces the Model 3600 Thermoelectric Temperature Control System for Plasma Processes

SAN JOSE, Calif., June 19, 2001Noah Precision , an Advanced Energy (AE) company (Nasdaq: AEIS), today announced the introduction of its Model 3600 point-of-use (POU) thermoelectric temperature control system for semiconductor plasma processes. The 3600 is the latest and most powerful addition to Noah’s portfolio of dynamic, POU temperature control systems. Developed specifically for very low-temperature oxide processes and new high-power-density 300 mm etch applications, the Model 3600 offers real-time, dynamic and independent temperature control of the cathode, anode and/or chamber walls.


"As semiconductor fabrication moves toward 300 mm processes, more powerful subsystems are required to address the scalability issues," said Doug Ryder, vice president of sales and marketing for Noah Precision. "The Model 3600 gives our customers the power, fast dynamic response, temperature stability and small foot print they require to successfully develop and run reliable, cost- effective processes. Noah and AE are continually striving to provide our customers with best-of-breed solutions—and the Model 3600’s solid-state, thermoelectric technology does that."

Using a Model 3600 system, etch engineers can accurately maintain control of wafer temperature during more demanding processes with temperature setpoints of -20º C and below. The Model 3600 features:

  • Dynamic cooling for wafer-temperature stability
  • Cooling capacity that satisfies the most demanding process requirements
  • High reliability with solid-state design
  • High mean time between failures and low cost of ownership
  • Environmental safety

Copies of the Model 3600 brochure are available on AE's website at www.advanced- or by sending a request via e-mail to The Model 3600 will be demonstrated at the Advanced Energy booth at SEMICON West in San Francisco, Calif., July 16-18, 2001.

About Advanced Energy
Advanced Energy is a global leader in the development, marketing and support of technology solutions that are central in the manufacture of semiconductors, data storage products and flat panel displays. Original equipment manufacturers (OEMs) and end-users around the world depend on AE products when plasma-based technology plays a vital role in their manufacturing process. AE offers a comprehensive suite of products for vacuum process systems, including power management, temperature sensing, dynamic temperature control, gas delivery management, process monitoring and machine control tools, ion-beam sources, and plasma abatement technologies. AE technology solutions are sold and supported globally by direct offices, representatives and distributors. Founded in 1981, AE is a publicly held company traded on Nasdaq under the symbol AEIS. AE's URL is