For more information, contact:

Jim Donaldson
Advanced Energy Industries, Inc.
Marna Shillman
Advanced Energy Industries, Inc.

RFMS RF Metrology System for End-Point Detection, within Wafer Excursion, and Wafer-to-Wafer Excursion now Available from Advanced Energy

June 28, 1999—The RFMS RF Metrology System, which solves many problems process engineers encounter with CVD and etch tools, is now available from Advanced Energy Industries, Inc. (Nasdaq: AEIS). The RFMS system allows tools to accommodate new processes and smaller geometries. It increases product yields and lowers costs by solving—and implementing controls for—these historically difficult problems:


  • End-point detection
  • Within wafer excursion detection
  • Wafer-to-wafer excursion detection

Copies of the brochure describing this RF Metrology System are available at no charge by sending a request via e-mail to or from the web at

Advanced Energy Industries, Inc. is a leading developer and manufacturer of power supplies and related products that are critical in the manufacturing of semiconductors, data storage devices, flat panel displays, and other industrial products using thin-film technology such as glass coatings, decorative coatings, and optical coatings. Founded in 1981, AE is a publicly held company traded on Nasdaq, symbol AEIS. Its web site address is