For more information, contact:

Joe Monkowski
Advanced Energy Industries, Inc.
Marna Shillman
Advanced Energy Industries, Inc.

Advanced Energy Releases Reactive Dual Magnetron Sputtering White Paper

May 12, 1999—Advanced Energy Industries, Inc. (Nasdaq: AEIS) has released “Closed-Loop Controlled Reactive Dual Magnetron Sputtering” as part of its series of technical white papers.


This particular white paper discusses the use of rapid closed-loop control of oxygen flow to prevent target poisoning and facilitate high growth rate during the reactive sputtering process. Specifically, low frequency ac dual magnetron reactive sputtering of dielectric thin film is covered. The paper concludes that aluminum oxide films ranging from metal rich to fully oxidized were obtained through stable closed-loop control. Results are compared to reactive sputtering of these films by other techniques.

Copies of this paper are available at no charge by sending a request via e-mail to or from the web at

Advanced Energy Industries, Inc. is a leading developer and manufacturer of power supplies and related products that are critical in the manufacturing of semiconductors, data storage devices, flat panel displays, and other products using thin-film technology. Founded in 1981, AE is a publicly held company. Its web site address is